27-733 Processing of Semiconductors and Thin Films
12 units, Carnegie Mellon University
The course covers semiconductor materials and device processing. It begins with an overview of the n-channel metal-oxide-semiconductor (NMOS) transistor, including device structure, operation, and key materials and performance metrics. This overview also introduces the process flow at the 28 nm technology node. Building on this foundation, the course focuses on unit processes used in the fabrication of complementary metal-oxide-semiconductor (CMOS) circuits. Topics include chemical vapor deposition and epitaxy, photolithography, selective doping by diffusion and ion implantation, oxidation and dielectric deposition, metallization, chemical-mechanical polishing, and wet and dry etching. Emphasis is placed on processing-induced defects and their effects on material properties and device performance. The course also introduces the finite difference method and its applications. Students complete several exercises using industry-standard Technology Computer-Aided Design (TCAD) software to model semiconductor fabrication processes and device characteristics.
Prerequisites: none listed
Offered: Fall 2026, Fall 2025
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