27-533 Processing of semiconductors and thin films

9 units, Carnegie Mellon University

The course covers semiconductor materials and device processing. It begins with an overview of the n-channel metal-oxide-semiconductor (NMOS) transistor, including device structure, operation, and key materials and performance metrics. This overview also introduces the process flow at the 28 nm technology node. Building on this foundation, the course focuses on unit processes used in the fabrication of complementary metal-oxide-semiconductor (CMOS) circuits. Topics include chemical vapor deposition and epitaxy, photolithography, selective doping by diffusion and ion implantation, oxidation and dielectric deposition, metallization, chemical-mechanical polishing, and wet and dry etching. Emphasis is placed on processing-induced defects and their effects on material properties and device performance.

Prerequisites: none listed

Offered: Fall 2026, Fall 2025

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